One-step 3D microstructuring of PMMA using MeV light ions

Abstract

The conventional procedure for creating 3D microstructures in resists by ion beam lithography consists of two stages – exposure and developing. However, single stage of manufacturing 3D structures in resist is also possible. Irradiation of PMMA can cause it to shrink. This feature of the polymer can be used for one-step three-dimensional microstructuring, which simplifies the manufacturing process. The shrinkage of PMMA film on a substrate has been extensively studied, while research on free-standing film is not comprehensive. The use of free-standing PMMA film allows the creation of a flexible material with 3D microstructures, which can be used in medicine, optics, and electronics. The question here is whether the results obtained for the PMMA film on the substrate are applicable to the freestanding film. Since the nature of shrinking is outgassing of volatile products, the film on the substrate has only one surface for the release of gases, while in the free-standing film, gases can be released from the sample from both sides. Therefore, the shrinking in the free-standing film occurs on both sides. The aim of this work is to study the shrinkage of the free-standing film and compare it with that of the film of the same thickness coated on the substrate.