Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов (Dec 2020)

STUDY OF ADSORPTION PROPERTIES OF NANOSTRUCTURED FILMS BASED ON TIN DIOXIDE

  • A.P. Sigaev,
  • I.A. Averin,
  • A.A. Karmanov,
  • I.A. Pronin,
  • N.D. Yakushova

DOI
https://doi.org/10.26456/pcascnn/2020.12.162
Journal volume & issue
no. 12
pp. 162 – 169

Abstract

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The results of theoretical and experimental studies of surface properties of nanostructured films based on tin dioxide using Fourier-transform infrared spectroscopy, ellipsometry and the indicator method of the distribution of adsorption centers are presented. Etching in inductively coupled plasma was used for additional post-processing of nanostructured films in order to activate the adsorption centers.

Keywords