ACS Omega (Jul 2017)

Chemically Stable Atomic-Layer-Deposited Al2O3 Films for Processability

Mikael Broas,
Olli Kanninen,
Vesa Vuorinen,
Markku Tilli,
Mervi Paulasto-Kröckel

Affiliations

Mikael Broas: Department of Electrical Engineering and Automation, Aalto University, Espoo, Finland
Olli Kanninen: Department of Electrical Engineering and Automation, Aalto University, Espoo, Finland
Vesa Vuorinen: Department of Electrical Engineering and Automation, Aalto University, Espoo, Finland
Markku Tilli: Okmetic Oy, Vantaa, Finland
Mervi Paulasto-Kröckel: Department of Electrical Engineering and Automation, Aalto University, Espoo, Finland

DOI: https://doi.org/10.1021/acsomega.7b00443
Journal volume & issue: Vol. 2, no. 7
pp. 3390 – 3398

Abstract

No abstracts available.

Published in ACS Omega

ISSN: 2470-1343 (Online)
Publisher: American Chemical Society
Country of publisher: United States
LCC subjects: Science: Chemistry
Website: https://pubs.acs.org/journal/acsodf

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