Magnetic Resonance Lithography with Nanometer Resolution
Fahad AlGhannam,
Philip Hemmer,
Zeyang Liao,
M. Suhail Zubairy
Affiliations
Fahad AlGhannam
Institute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USA
Philip Hemmer
Department of Electrical & Computer Engineering, Texas A&M University, College Station, TX 77843-4242, USA
Zeyang Liao
Institute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USA
M. Suhail Zubairy
Institute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USA
We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast.
