No-code method for lithography template cell parameterization for faster design cycles

Abstract

This work presents a Python-based architecture packaged as a standalone tool, to enable the parameterization of lithography structures without the need for scripting. By feeding a lithography template file obtained from an existing layout editor into the tool, a ‘scaffold’ shape is created and recognised. The tool allows for the parameterization of created geometries and the establishment of parameterized rules between geometric features, which can be conveniently modified in tabular format. This work facilitates no-code procedural generation of geometrically distinct instances, significantly reducing the time required for complex lithography template development compared to traditional scripting methods.

Keywords

• Lithography
• Lithography template
• Mask fabrication
• Layout editor
• Nanopatterning
• MEMS