Materials Letters: X (Sep 2022)

Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy

  • Melquisedec Vicente Mendoza,
  • Edgar Serrano Peréz,
  • Fernando Juárez López

Journal volume & issue
Vol. 15
p. 100160

Abstract

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Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermo-gravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.

Keywords