Study on the Surface Morphology of Thermochromic Rf-Sputtered VO₂ Films Using Temperature-Dependent Atomic Force Microscopy

Abstract

Vanadium dioxide (VO2) is a well-known phase-changing material that goes from a semiconducting state to a metallic one at a critical temperature of 68 °C, which is the closest to room temperature (25 °C). The electrical transition is also accompanied by structural and optical changes. The optical transition upon heating-also known as thermochromism-makes VO2 a possible coating for “intelligent” windows. In this work, the relationship between the thermochromic performance of VO2 films and the surface morphology was investigated using Temperature-dependent Atomic Force Microscopy (T-AFM) in conjunction with the X-ray Diffraction technique and Scanning Electron Microscopy. In particular, VO2 films were deposited using the rf sputtering technique on Silicon and glass substrates at a substrate temperature of 300 °C, which is one of the lowest for this technique to grow the thermochromic monoclinic phase of VO2. It was found that upon heating (25–100 °C), there was a decrease in RMS roughness for all films independent from the substrate; the value of RMS roughness, however, varied depending on the substrate. Finally, the thermochromic parameters of the VO2 films were correlated with the surface morphology and appeared to be dependent on the kind of substrate used.

Keywords

• thermochromic VO₂ films
• rf sputtering
• temperature-dependent AFM