APL Materials (Jan 2014)

Intrinsic magnetic properties of hexagonal LuFeO3 and the effects of nonstoichiometry

  • Jarrett A. Moyer,
  • Rajiv Misra,
  • Julia A. Mundy,
  • Charles M. Brooks,
  • John T. Heron,
  • David A. Muller,
  • Darrell G. Schlom,
  • Peter Schiffer

DOI
https://doi.org/10.1063/1.4861795
Journal volume & issue
Vol. 2, no. 1
pp. 012106 – 012106-8

Abstract

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We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO3 (h-LuFeO3) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO3 to have a TN = 147 K and Ms = 0.018 μB/Fe.