Multilevel phase supercritical lens fabricated by synergistic optical lithography

Abstract

The advent of planar metalenses, including the super-oscillatory lens (SOL) and the supercritical lens (SCL) with distinctive interference properties, has profoundly impacted on the long-lasting perception of the far-field optical diffraction limit. In spite of its conspicuous success in achieving marvelously small focal spots, the planar metalens still faces tough design and fabrication challenges to realize high focusing efficiency. In this work, we demonstrated a dual-mode laser fabrication technique based on two-photon polymerization for realizing the multilevel phase SCL with focusing efficiency spiking. Synergistically controlling two types of movement trajectory, which is implemented with the piezo stage and the scanning galvo mirror, enables the fabrication of complicated structures with sub-diffraction-limit feature size. By utilizing such advantage, SCLs with discretized multilevel phase configurations are explicitly patterned. The experimental characterization results have shown that a four-level phase SCL can focus light into a sub-diffraction-limit spot with the lateral size of 0.41 λ/NA (NA is the numerical aperture), while achieve the focal spot intensity and the energy concentration ratio in the focal region 7.2 times and 3 times that of the traditional binary amplitude-type SCL with the same optimization conditions, respectively. Our results may release the application obstacles for the sub-diffraction-limit planar metalens and enable major advances in the fields from label-free optical super-resolution imaging to high precision laser fabrication.

Keywords

• supercritical lens
• sub-diffraction-limit focusing
• two photon-optimization optical lithography
• multilevel phase
• high efficiency