Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma

Abstract

In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear.

Keywords

• diamond-like carbon
• microwave sheath voltage combination plasma
• thermal stability
• in situ high-temperature tribological properties