Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

Kun Shuai; Yuanan Zhao; Xiaofeng Liu; Xiangkun Lin; Zhilin Xia; Keqiang Qiu; Dawei Li; He Gong; Yan Zhou; Jian Sun; Li Zhou; Youen Jiang; Yaping Dai; Jianda Shao

doi:10.1017/hpl.2023.74

High Power Laser Science and Engineering (Jan 2023)

Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

Kun Shuai,
Yuanan Zhao,
Xiaofeng Liu,
Xiangkun Lin,
Zhilin Xia,
Keqiang Qiu,
Dawei Li,
He Gong,
Yan Zhou,
Jian Sun,
Li Zhou,
Youen Jiang,
Yaping Dai,
Jianda Shao

Affiliations

Kun Shuai: ORCiD; Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
Yuanan Zhao: ORCiD; Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
Xiaofeng Liu: ORCiD; Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
Xiangkun Lin: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
Zhilin Xia: School of Materials Science and Engineering, Wuhan University of Technology, Wuhan, China
Keqiang Qiu: National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, China
Dawei Li: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
He Gong: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai, China
Yan Zhou: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai, China
Jian Sun: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
Li Zhou: National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Youen Jiang: National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Yaping Dai: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, China
Jianda Shao: Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China

DOI: https://doi.org/10.1017/hpl.2023.74
Journal volume & issue: Vol. 11

Abstract

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Multilayer dielectric gratings (MLDGs) are crucial for pulse compression in picosecond–petawatt laser systems. Bulged nodular defects, embedded in coating stacks during multilayer deposition, influence the lithographic process and performance of the final MLDG products. In this study, the integration of nanosecond laser conditioning (NLC) into different manufacturing stages of MLDGs was proposed for the first time on multilayer dielectric films (MLDFs) and final grating products to improve laser-induced damage performance. The results suggest that the remaining nodular ejection pits introduced by the two protocols exhibit a high nanosecond laser damage resistance, which remains stable when the irradiated laser fluence is more than twice the nanosecond-laser-induced damage threshold (nanosecond-LIDT) of the unconditioned MLDGs. Furthermore, the picosecond-LIDT of the nodular ejection pit conditioned on the MLDFs was approximately 40% higher than that of the nodular defects, and the loss of the grating structure surrounding the nodular defects was avoided. Therefore, NLC is an effective strategy for improving the laser damage resistance of MLDGs.

Published in High Power Laser Science and Engineering

ISSN: 2095-4719 (Print); 2052-3289 (Online)
Publisher: Cambridge University Press
Country of publisher: United Kingdom
LCC subjects: Technology: Engineering (General). Civil engineering (General): Applied optics. Photonics
Website: https://www.cambridge.org/core/journals/high-power-laser-science-and-engineering

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