Method for releasing carbon foils from substrates

Abstract

The performance of a carbon foil (C-foil) as a charge stripper in an accelerator is directly affected by its condition and quality. C-foils are fabricated by evaporating carbon onto a substrate. Therefore, a suitable technique must be established for depositing and removing C-foils from substrates. The selection of appropriate releasing agents is crucial for the removal process. C-foils with thicknesses less than 0.1 mg/cm2 were produced using the arc discharge method, wherein chloride materials were used as releasing agents. The magnetron sputtering method is suitable for manufacturing C-foils thicker than 0.1 mg/cm2 using appropriate releasing agents, such as fluorine-based or silicon-based agents. The contact angle analysis demonstrates a negative relationship between the C-foil thickness and the wettability of the substrate treated with an appropriate releasing agent. The possibility of using ionic liquids as novel releasing agents is also investigated.