Micromachines (Oct 2018)

AlGaN/GaN High Electron Mobility Transistors on Semi-Insulating Ammono-GaN Substrates with Regrown Ohmic Contacts

  • Wojciech Wojtasiak,
  • Marcin Góralczyk,
  • Daniel Gryglewski,
  • Marcin Zając,
  • Robert Kucharski,
  • Paweł Prystawko,
  • Anna Piotrowska,
  • Marek Ekielski,
  • Eliana Kamińska,
  • Andrzej Taube,
  • Marek Wzorek

DOI
https://doi.org/10.3390/mi9110546
Journal volume & issue
Vol. 9, no. 11
p. 546

Abstract

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AlGaN/GaN high electron mobility transistors on semi-insulating bulk ammonothermal GaN have been investigated. By application of regrown ohmic contacts, the problem with obtaining low resistance ohmic contacts to low-dislocation high electron mobility transistor (HEMT) structures was solved. The maximum output current was about 1 A/mm and contact resistances was in the range of 0.3⁻0.6 Ω ·mm. Good microwave performance was obtained due to the absence of parasitic elements such as high access resistance.

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