Micromachines
(Oct 2018)
AlGaN/GaN High Electron Mobility Transistors on Semi-Insulating Ammono-GaN Substrates with Regrown Ohmic Contacts
Wojciech Wojtasiak,
Marcin Góralczyk,
Daniel Gryglewski,
Marcin Zając,
Robert Kucharski,
Paweł Prystawko,
Anna Piotrowska,
Marek Ekielski,
Eliana Kamińska,
Andrzej Taube,
Marek Wzorek
Affiliations
Wojciech Wojtasiak
Institute of Radioelectronics and Multimedia Technology, Warsaw University of Technology, Nowowiejska 15/19, 00-662 Warsaw, Poland
Marcin Góralczyk
Institute of Radioelectronics and Multimedia Technology, Warsaw University of Technology, Nowowiejska 15/19, 00-662 Warsaw, Poland
Daniel Gryglewski
Institute of Radioelectronics and Multimedia Technology, Warsaw University of Technology, Nowowiejska 15/19, 00-662 Warsaw, Poland
Marcin Zając
Ammono Lab, Institute of High Pressure Physics, Polish Academy of Sciences, Sokołowska 29/37, 01-142 Warsaw, Poland
Robert Kucharski
Ammono Lab, Institute of High Pressure Physics, Polish Academy of Sciences, Sokołowska 29/37, 01-142 Warsaw, Poland
Paweł Prystawko
TopGaN Ltd., Sokołowska 29/37, 01-142 Warsaw, Poland
Anna Piotrowska
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Marek Ekielski
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Eliana Kamińska
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Andrzej Taube
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Marek Wzorek
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
DOI
https://doi.org/10.3390/mi9110546
Journal volume & issue
Vol. 9,
no. 11
p.
546
Abstract
Read online
AlGaN/GaN high electron mobility transistors on semi-insulating bulk ammonothermal GaN have been investigated. By application of regrown ohmic contacts, the problem with obtaining low resistance ohmic contacts to low-dislocation high electron mobility transistor (HEMT) structures was solved. The maximum output current was about 1 A/mm and contact resistances was in the range of 0.3⁻0.6 Ω ·mm. Good microwave performance was obtained due to the absence of parasitic elements such as high access resistance.
Keywords
WeChat QR code
Close