Chemical Vapor Deposition Method and Types in Thin Film Production

Abstract

Thin film technology is widely used in almost every sector. Especially it is used in the electronic device industry. The most important factor in preferring thin films is that their morphological structure can be adjusted depending on their production, their stoichiometry can be controlled and their homogeneity. For this reason, thin film production technique is really important. The most commonly used method to obtain these properties is the chemical vapor deposition method. Depending on this method, studies have been made on different designs. In this study, chemical vapor deposition (CVD) method and its types were investigated and it was aimed to compare the methods.