Advances in Electrical and Electronic Engineering (Jan 2006)

ZnO Nanostructures Prepared by RF Sputtering

  • Sona Flickyngerova,
  • Vladimir Tvarozek,
  • Ivan Novotny,
  • Alexander Satka,
  • Pavol Sutta

Journal volume & issue
Vol. 5, no. 1
pp. 330 – 333

Abstract

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ZnO is shortly reviewed as significant material for nanotechnology. Sputtered ZnO thin films showed colummarpolycrystalline structure with preffered orientation in <002> direction, resistivity ~ 1 Wcm and optical bandgap Eg = 3,33 eV. Nanoclusters of Au and ZnO were formed by use of RF sputtering.

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