AIP Advances (Feb 2020)

Hybrid integration of carbon nanotube and amorphous IGZO thin-film transistors

  • Yongwoo Lee,
  • Jinsu Yoon,
  • Jun Tae Jang,
  • Bongsik Choi,
  • Hyo-Jin Kim,
  • Geon-Hwi Park,
  • Dong Myong Kim,
  • Dae Hwan Kim,
  • Min-Ho Kang,
  • Sung-Jin Choi

DOI
https://doi.org/10.1063/1.5139085
Journal volume & issue
Vol. 10, no. 2
pp. 025131 – 025131-5

Abstract

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Solution-processed carbon nanotubes (CNTs) have recently attracted significant attention as p-type thin-film transistor (TFT) channels due to their high carrier mobility, high uniformity, and low process temperature. However, implementing sophisticated macroelectronics with a combination of single CNT-TFTs has been challenging because it is difficult to fabricate n-type CNT-TFTs. Therefore, in combination with indium-gallium-zinc-oxide (IGZO), which has excellent electrical performance and has been commercialized as an n-type oxide TFT, we demonstrated various hybrid complementary metal-oxide semiconductor integrated circuits, such as inverters and nor and nand gates. This hybrid integration approach allows us to combine the strength of p-type CNT- and n-type IGZO-TFTs, thus offering a significant improvement for macroelectronic applications.