Breakthroughs in Photonics 2013: Organic Nanostructures for Antireflection

U. Schulz; P. Munzert; F. Rickelt; N. Kaiser

doi:10.1109/JPHOT.2014.2311432

IEEE Photonics Journal (Jan 2014)

Breakthroughs in Photonics 2013: Organic Nanostructures for Antireflection

U. Schulz,
P. Munzert,
F. Rickelt,
N. Kaiser

Affiliations

U. Schulz: Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany
P. Munzert: Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany
F. Rickelt: Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany
N. Kaiser: Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany

DOI: https://doi.org/10.1109/JPHOT.2014.2311432
Journal volume & issue: Vol. 6, no. 2
pp. 1 – 5

Abstract

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The processing of organic substances by vacuum deposition is opening new possibilities for the properties of optical surfaces. Organic small molecules can be evaporated and deposited like optical thin films. Plasma etching, which has been successfully applied to generate nanostructures on polymer substrates, is now used for obtaining antireflective nanostructures on top of interference stacks on glass. The latest results in achieving excellent antireflective properties for a wide range of light incidence angles were accomplished through multiple etching of polymer substrates and organic layers.

Published in IEEE Photonics Journal

ISSN: 1943-0655 (Online)
Publisher: IEEE
Country of publisher: United States
LCC subjects: Technology: Engineering (General). Civil engineering (General): Applied optics. Photonics; Science: Physics: Optics. Light
Website: http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=4563994

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