Nanomechanical parameters of new carbazolyle-containing photoresist polymers

Abstract

The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate the nanomechanical parameters of polymer films. The reliability of the chosen analytical method was checked using number of repeats. The influence of chemical composition, action of UF-light and aging on the nanomechanical properties of CAM: OMA and PEPC were investigated.