Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending
Zhiyong Wu,
Jiacheng Luo,
Luyang Li,
Qingshu Dong,
Xiaohui Zhang,
Zili Li,
Yadong Liu,
Shengxiang Ji,
Weihua Li,
Yan Zhang,
Shisheng Xiong
Affiliations
Zhiyong Wu
Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China
Jiacheng Luo
Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China
Luyang Li
State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
Qingshu Dong
State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
Xiaohui Zhang
State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
Zili Li
Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China; Zhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China; Corresponding author
Yadong Liu
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
Shengxiang Ji
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
Weihua Li
State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
Yan Zhang
Zhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China
Shisheng Xiong
Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China; Zhangjiang Laboratory, 100 Haike Road, Shanghai 201204, China; Corresponding author
Summary: Directed self-assembly (DSA) lithography has demonstrated significant potential in fabricating integrated circuits. However, DSA encounters limited processing windows due to the requirement for precise matching between the period of block copolymers (BCPs) and graphoepitaxy templates. We propose a binary BCP/homopolymer blending strategy to manipulate the self-assembly behavior and the processing window of graphoepitaxy DSA in contact hole shrinking. By carefully tailoring the blending rates of poly(methyl methacrylate) (PMMA) with different molecular weights in cylindrical polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA), we manipulate the period and morphology of BCP/homopolymer self-assembly. Specifically, we employ BCP/homopolymer blending to fine-tune the critical dimension (CD) of contact holes with PS-affined topographical templates. Subsequent pattern transferring is achieved by selectively etching defect-free shrinkable cylinders as hard masks. Furthermore, self-consistent field theory (SCFT) simulation was employed to explore the self-assembly of BCP/homopolymer blending in confined cylindrical space and the results were in good consistency with the experimental results.
