Active and Passive Electronic Components (Jan 2002)

Silicon Micromachining for High Performance Passive Structures at W Band

  • B. Guillon,
  • K. Grenier,
  • T. Parra,
  • P. Pons,
  • D. Cros,
  • P. Blondy,
  • J. Graffeuil,
  • J. L. Cazaux,
  • R. Plana

DOI
https://doi.org/10.1080/08827510211278
Journal volume & issue
Vol. 25, no. 1
pp. 113 – 122

Abstract

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This paper presents a micromachined technology allowing the realization of very high aspect ratio millimeter-wave circuits. Appropriate 3D electromagnetic simulations based on the finite element method have been implemented to design the circuits. Coplanar transmission lines featuring loss level in the 2 dB range up to 105 GHz have been realized. An original silicon micromachined cavity using the whispering gallery modes properties has been realized achieving a quality factor close to 10,000 range at 95 GHz.