Nature Communications (Jul 2019)

Identifying substitutional oxygen as a prolific point defect in monolayer transition metal dichalcogenides

  • Sara Barja,
  • Sivan Refaely-Abramson,
  • Bruno Schuler,
  • Diana Y. Qiu,
  • Artem Pulkin,
  • Sebastian Wickenburg,
  • Hyejin Ryu,
  • Miguel M. Ugeda,
  • Christoph Kastl,
  • Christopher Chen,
  • Choongyu Hwang,
  • Adam Schwartzberg,
  • Shaul Aloni,
  • Sung-Kwan Mo,
  • D. Frank Ogletree,
  • Michael F. Crommie,
  • Oleg V. Yazyev,
  • Steven G. Louie,
  • Jeffrey B. Neaton,
  • Alexander Weber-Bargioni

DOI
https://doi.org/10.1038/s41467-019-11342-2
Journal volume & issue
Vol. 10, no. 1
pp. 1 – 8

Abstract

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The nature of defects in transition metal dichalcogenide semiconductors is still under debate. Here, the authors determine the atomic structure and electronic properties of chalcogen-site point defects common to monolayer MoSe2 and WS2, and find that these are substitutional defects, where a chalcogen atom is substituted by an oxygen atom, rather than vacancies.