Phase-shift mask fabrication at micrometric scale by ion-exchange in glass for astronomical wavefront sensors

Prieto-Blanco Xesús; Montero-Orille Carlos; González-Núñez Héctor; Moreno Vicente; Cagigal Manuel P.; Liñares Jesús

doi:10.1051/epjconf/202023802004

EPJ Web of Conferences (Jan 2020)

Phase-shift mask fabrication at micrometric scale by ion-exchange in glass for astronomical wavefront sensors

Prieto-Blanco Xesús,
Montero-Orille Carlos,
González-Núñez Héctor,
Moreno Vicente,
Cagigal Manuel P.,
Liñares Jesús

Affiliations

Prieto-Blanco Xesús: Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n
Montero-Orille Carlos: Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n
González-Núñez Héctor: Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n
Moreno Vicente: Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n
Cagigal Manuel P.: Department of Applied Physics, University of Cantabria
Liñares Jesús: Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n

DOI: https://doi.org/10.1051/epjconf/202023802004
Journal volume & issue: Vol. 238
p. 02004

Abstract

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Photolithography combined with ion-exchange in glass is a well-known technology that can be applied to develop many different optical devices. In this work, we present the complete procedure to generate small circular phase-shift masks with diameters of only a few microns and high control in the phase change produced. It is a strategic element in applications such as optical astronomy.

Published in EPJ Web of Conferences

ISSN: 2100-014X (Online)
Publisher: EDP Sciences
Country of publisher: France
LCC subjects: Science: Physics
Website: http://www.epj-conferences.org/

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