Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays

Abstract

The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method. The arrays of carbon nanotubes were grown by direct current plasma-enhanced chemical vapor deposition on a pure Si substrate using a nickel oxide catalyst which was also deposited by atomic layer deposition. The emission characteristics of an array of pure vertically oriented carbon nanotubes with a structure identical in morphology, covered with a layer of thin nickel oxide, are compared using the data from a unique computerized field emission projector. The deposition of an oxide coating favorably affected the emission current fluctuations, reducing them from 40% to 15% for a pristine carbon nanotube and carbon nanotube/nickel oxide, respectively. However, the 7.5 nm nickel oxide layer coating leads to an increase in the turn-on field from 6.2 to 9.7 V/µm.

Keywords

• atomic layer deposition (ALD)
• thin film structures
• field emission cathode
• composite structures
• carbon nanotubes
• direct current plasma-enhanced chemical vapor deposition (DC-PECVD)