Fouling Removal of UF Membrane with Coated TiO2 Nanoparticles under UV Irradiation for Effluent Recovery during TFT-LCD Manufacturing

Abstract

An ultrafiltration (UF) membrane process was employed to treat the secondary effluent discharged from a manufacturing of thin film transistor-liquid crystal display (TFT-LCD) in this study. A bench-scale system was performed to evaluate the fouling removal of a UF membrane with coated titanium dioxide (TiO2) nanoparticles under UV irradiation. The operating pressure and feed temperature were controlled at 300 KN/m2 and 25°C, respectively. It was found that the optimum operating conditions were attained with TiO2 concentrations of 10 wt% for both 5 KD and 10 KD MWCO. Continuous UV irradiation of 5 KD MWCO improved the permeate flux rate from 45.0% to 59.5% after 4 hours of operation. SEM-EDS analysis also showed that the photocatalytic effect had reduced the average thickness of cake fouling on the membrane from 6.40 μm to 2.70 μm for 5 KD MWCO and from 6.70 μm to 3.1 μm for 10 KD MWCO. In addition, the membrane contact angle was reduced from 54° to 44°. The photocatalytic properties of TiO2 apparently increased the hydrophilicity of the membrane surface, thereby reducing membrane fouling.