Sensors (Jan 2011)

Photo-EMF Sensitivity of Porous Silicon Thin Layer–Crystalline Silicon Heterojunction to Ammonia Adsorption

  • Kae Dal Kwack,
  • Jae Il Jung,
  • Yuriy Vashpanov

DOI
https://doi.org/10.3390/s110201321
Journal volume & issue
Vol. 11, no. 2
pp. 1321 – 1327

Abstract

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A new method of using photo-electromotive force in detecting gas and controlling sensitivity is proposed. Photo-electromotive force on the heterojunction between porous silicon thin layer and crystalline silicon wafer depends on the concentration of ammonia in the measurement chamber. A porous silicon thin layer was formed by electrochemical etching on p-type silicon wafer. A gas and light transparent electrical contact was manufactured to this porous layer. Photo-EMF sensitivity corresponding to ammonia concentration in the range from 10 ppm to 1,000 ppm can be maximized by controlling the intensity of illumination light.

Keywords