Influence of Refractive Index on Antireflectance Efficiency of Thin Films

Abstract

In today’s world, scientific development is tremendously strengthened by imitating natural processes. This development remarkably validates progressive and efficient operation of multifunctional thin films in variable ecological circumstances. We use TFCalc thinfilm software, a reliable and trustworthy simulation tool, to design antireflective (AR) coatings for solar cells that can operate in varying environmental conditions and can be functional according to user-defined conditions. Silicon nearly reflects 36% light in the 550 nm wavelength region, causing a significant loss in solar cell efficiency. We used silicon as the substrate on which we designed and fabricated a trilayer inorganic oxide AR thin films, and this reduced it reflectance to <4% in the 300~800 nm wavelength range. Because of their distinguishing physical physiognomies, we used a combination of different inorganic oxides, comprising high-, low-, and medium-refractive indices, to model AR coatings in the desired wavelength range. Experimental implementation of the designed AR thin films in the present study unlocks new techniques for production of competent, wideband-tunable AR coatings that are applicable in high-performance photovoltaic applications.

Keywords

• refractive index
• antireflective
• thin film
• wavelength
• simulation
• substrate