Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA

Abstract

This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PMMA - interference lithography using two coherent laser beams, nanoimprint lithography and lithography using nearfield scanning optical microscope.

Keywords

• no keywords