An Optimized Ultrasonic Spray Pyrolysis Device for The Production of Metal Oxide Films and Their Morfology

Abstract

In this work, we developed an optimized ultrasonic spray pyrolysis device for obtaining metal oxide films. The key benefit of this facility lies in its cost-effectiveness and its ability to consistently coat extensive surfaces without sacrificing the integrity of the semi-conductive films, thus streamlining the manufacturing process of semiconductor films. The resulting films exhibit the following attributes: the thickness of the deposited layer is approximately 400 nm, while the diameters of ZnO1-xSx nanocrystals range from 50 to 200 nm, oriented perpendicular to the crystallographic orientation (111). In the production of nanorods, the average height is estimated to be approximately 30-50 nm, with a density of 2.9×10¹¹ cm⁻² being indicated.

Keywords

• film
• space group
• subcrystal
• nanocrystal
• quantum size effect
• lattice parameter
• transparent electronics
• band gap