Micromachines (Mar 2022)

Optimization of Feedback FET with Asymmetric Source Drain Doping Profile

  • Inyoung Lee,
  • Hyojin Park,
  • Quan The Nguyen,
  • Garam Kim,
  • Seongjae Cho,
  • Ilhwan Cho

DOI
https://doi.org/10.3390/mi13040508
Journal volume & issue
Vol. 13, no. 4
p. 508

Abstract

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A feedback field-effect transistor (FBFET) is a novel device that uses a positive feedback mechanism. FBFET has a high on-/off ratio and is expected to realize ideal switching characteristics through steep changes from off-state to on-state. In this paper, we propose and optimize FBFET devices with asymmetric source/drain doping concentrations. Additionally, we discuss the changes in electrical characteristics across various channel length and channel thickness conditions and compare them with those of FBFET with a symmetric source/drain. This shows that FBFET with an asymmetric source/drain has a higher on-/off ratio than FBFET with a symmetric source/drain.

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