AIP Advances (Mar 2017)

UVB-emitting InAlGaN multiple quantum well synthesized using plasma-assisted molecular beam epitaxy

  • W. Kong,
  • A. T. Roberts,
  • W. Y. Jiao,
  • J. Fournelle,
  • T. H. Kim,
  • M. Losurdo,
  • H. O. Everitt,
  • A. S. Brown

DOI
https://doi.org/10.1063/1.4973637
Journal volume & issue
Vol. 7, no. 3
pp. 035109 – 035109-7

Abstract

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A high Al-content (y > 0.4) multi-quantum-well (MQW) structure with a quaternary InxAlyGa(1-x-y)N active layer was synthesized using plasma-assisted molecular beam epitaxy. The MQW structure exhibits strong carrier confinement and room temperature ultraviolet-B (UVB) photoluminescence an order of magnitude stronger than that of a reference InxAlyGa(1-x-y)N thin film with comparable composition and thickness. The samples were characterized using spectroscopic ellipsometry, atomic force microscopy, and high-resolution X-ray diffraction. Numerical simulations suggest that the UVB emission efficiency is limited by dislocation-related non-radiative recombination centers in the MQW and at the MQW - buffer interface. Emission efficiency can be significantly improved by reducing the dislocation density from 109cm−2 to 107cm−2 and by optimizing the width and depth of the quantum wells.