EPJ Web of Conferences (Jan 2021)

Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation

  • Lee Mane-Si Laure,
  • Cholet Julie,
  • Delboulbé Anne,
  • Guillemet Raphaël,
  • Loiseaux Brigitte,
  • Garabedian Patrick,
  • Flügel-Paul Thomas,
  • Benkenstein Tino,
  • Sadlowski Susann,
  • Tetaz Nicolas,
  • Windpassinger Roman,
  • Mahalik Saroj

DOI
https://doi.org/10.1051/epjconf/202125512014
Journal volume & issue
Vol. 255
p. 12014

Abstract

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We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application.