Materials (Jul 2019)

Native Point Defect Measurement and Manipulation in ZnO Nanostructures

  • Leonard Brillson,
  • Jonathan Cox,
  • Hantian Gao,
  • Geoffrey Foster,
  • William Ruane,
  • Alexander Jarjour,
  • Martin Allen,
  • David Look,
  • Holger von Wenckstern,
  • Marius Grundmann

DOI
https://doi.org/10.3390/ma12142242
Journal volume & issue
Vol. 12, no. 14
p. 2242

Abstract

Read online

This review presents recent research advances in measuring native point defects in ZnO nanostructures, establishing how these defects affect nanoscale electronic properties, and developing new techniques to manipulate these defects to control nano- and micro- wire electronic properties. From spatially-resolved cathodoluminescence spectroscopy, we now know that electrically-active native point defects are present inside, as well as at the surfaces of, ZnO and other semiconductor nanostructures. These defects within nanowires and at their metal interfaces can dominate electrical contact properties, yet they are sensitive to manipulation by chemical interactions, energy beams, as well as applied electrical fields. Non-uniform defect distributions are common among semiconductors, and their effects are magnified in semiconductor nanostructures so that their electronic effects are significant. The ability to measure native point defects directly on a nanoscale and manipulate their spatial distributions by multiple techniques presents exciting possibilities for future ZnO nanoscale electronics.

Keywords