AIP Advances (Feb 2014)

Thermal conductivity of sputtered amorphous Ge films

  • Tianzhuo Zhan,
  • Yibin Xu,
  • Masahiro Goto,
  • Yoshihisa Tanaka,
  • Ryozo Kato,
  • Michiko Sasaki,
  • Yutaka Kagawa

DOI
https://doi.org/10.1063/1.4867122
Journal volume & issue
Vol. 4, no. 2
pp. 027126 – 027126-7

Abstract

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We measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and Ge film density were not the main factors in the high thermal conductivity. Fast Fourier transform patterns of transmission electron micrographs revealed that short-range order in the Ge films was responsible for their high thermal conductivity. The results provide experimental evidences to understand the underlying nature of the variation of phonon mean free path in amorphous solids.