Silicon flower structures by maskless plasma etching
Geng Zhao,
Xiaoyan Zhao,
Haimiao Zhang,
Ziwei Lian,
Yongmin Zhao,
Anjie Ming,
Yuanwei Lin
Affiliations
Geng Zhao
Institute of Solid State Physics, College of Physics and Electronic Science, Shanxi Province Key Laboratory of Microstructure Electromagnetic Functional Materials, Datong University, Datong, 037054, Shanxi Province, China; Department of Physics, Fudan University, Shanghai, 200433, China; Laboratory of Micro-Nano Optoelectronic Materials and Devices, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800, China
Xiaoyan Zhao
Department of Semiconductor Etching, NAURA Technology Group Co., Ltd., Beijing, 100176, China
Haimiao Zhang
Department of Semiconductor Etching, NAURA Technology Group Co., Ltd., Beijing, 100176, China
Ziwei Lian
State Key Laboratory of Advanced Materials for Smart Sensing, General Research Institute for Nonferrous Metals, Beijing, 101402, China
Yongmin Zhao
State Key Laboratory of Advanced Materials for Smart Sensing, General Research Institute for Nonferrous Metals, Beijing, 101402, China
Anjie Ming
State Key Laboratory of Advanced Materials for Smart Sensing, General Research Institute for Nonferrous Metals, Beijing, 101402, China; Corresponding author.
Yuanwei Lin
Department of Semiconductor Etching, NAURA Technology Group Co., Ltd., Beijing, 100176, China; Corresponding author.
Silicon nano/microstructures are widely utilized in the semiconductor industry, and plasma etching is the most prominent method for fabricating silicon nano/microstructures. Among the variety of silicon nano/microstructures, black silicon with light-trapping properties has garnered broad interest from both the scientific and industrial communities. However, the fabrication mechanism of black silicon remains unclear, and the light absorption of black silicon only focuses on the near-infrared region thus far. Herein, we demonstrate that black silicon can be fabricated from individual flower-like silicon microstructures. Using fluorocarbon gases as etchants, silicon flower microstructures have been formed via maskless plasma etching. Black silicon forming from silicon flower microstructures exhibits strong absorption with wavelength from 0.25 μm to 20 μm. The result provides novel insight into the understanding of the plasma etching mechanism in addition to offering further significant practical applications for device manufacturing.
