AIP Advances (Sep 2012)

Beam profile indicator for swift heavy ions using phosphor afterglow

  • T. Z. Zhan,
  • C. N. Xu,
  • H. Yamada,
  • Y. Terasawa,
  • L. Zhang,
  • H. Iwase,
  • M. Kawai

DOI
https://doi.org/10.1063/1.4739407
Journal volume & issue
Vol. 2, no. 3
pp. 032116 – 032116-5

Abstract

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In this letter, we report a beam profile indicator for swift heavy ions (SHIs) which utilizes the afterglow of phosphors. Clear marks are left on SrAl2O4:Eu2+ and CaSrAl2Si2O8:Eu2+ samples by SHI irradiation through a permanent change of their afterglow intensity. The afterglow intensity of the SHI-irradiated areas has a Gaussian distribution. Moreover, afterglow intensity and irradiation fluence are linearly related, indicating that this type of indicator has good dose linearity. The results suggest that long-lasting phosphors are promising SHI beam profile indicators with high spatial resolution.