Structural And Optical Properties Of VOx Thin Films

Abstract

VOx thin films were deposited on Corning glass, fused silica and Ti foils by means of rf reactive sputtering from a metallic vanadium target. Argon-oxygen gas mixtures of different compositions controlled by the flow rates were used for sputtering. Influence of the oxygen partial pressure in the sputtering chamber on the structural and optical properties of thin films has been investigated.

Keywords

• VOx thin films
• reactive sputtering
• microstructure
• optical properties
• energy band gap