Nanoscale Research Letters (Nov 2020)

Characterization and Fabrication of the CFM-JTE for 4H-SiC Power Device with High-Efficiency Protection and Increased JTE Dose Tolerance Window

  • Yi Wen,
  • Xiao-jie Xu,
  • Meng-ling Tao,
  • Xiao-fei Lu,
  • Xiao-chuan Deng,
  • Xuan Li,
  • Jun-tao Li,
  • Zhi-qiang Li,
  • Bo Zhang

DOI
https://doi.org/10.1186/s11671-020-03443-5
Journal volume & issue
Vol. 15, no. 1
pp. 1 – 8

Abstract

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Abstract A 13.5 kV 4H-SiC PiN rectifier with a considerable active area of 0.1 cm2 is fabricated in this paper. Charge-field-modulated junction termination extension (CFM-JTE) has been proposed for satisfying the requirement of ultra-high reverse voltage, which enlarges the JTE dose tolerance window, making it approximately 2.8 times that of the conventional two-zone JTE. Besides, the CFM-JTE can be implemented through the conventional two-zone JTE process. The measured forward current is up to 100 A @ V F = 5.2 V in the absence of carrier lifetime enhancement technology. The CFM-JTE structure accomplishes 96% of the theoretical breakdown voltage of the parallel plane junction with a relatively small terminal area of 400 μm, which contributes to achieving the Baliga’s figure of merit of 58.8 GW/cm2.

Keywords