Dissolution Behavior of Fluoroalkylated Diazonaphthoquinone and Its Blends with Fluorinated Copolymers under UV Irradiation

Abstract

This article reports on the synthesis of materials containing both a fluoroalkyl group and a diazonaphthoquinone (DNQ) moiety as well as the fabrication of negative- and positive-tone stencil patterns. Additionally, the photoreaction mechanism that contributes to the pattern formation process is discussed, and the application of these materials is explored in the pixel-formation process in organic light-emitting diode (OLED) displays. Fluoroalkylated diazonaphthoquinone (RF2D1) was synthesized using chemically binding a DNQ unit, which can be converted into carboxylic acid derivatives having stronger polarity, with two fluorinated alkyl chains. The purified compound is found to be soluble in a nonpolar fluorous solvent and can be uniformly coated as a thin film. When the thin film of RF2D1 is exposed to 365 nm UV light, its solubility in a fluorous solvent decreases due to the Wolff rearrangement and subsequent hydrolysis of a ketene moiety. In contrast, when a mixture of RF2D1 and a hydrophobic, fluorinated copolymer is tested for the patterning process, the copolymer delays the conversion of the ketene intermediate to carboxylic acid, resulting in the dissolution of the exposed areas in the fluorous solvent. Finally, the applicability of these materials in micropatterning is demonstrated by adopting them in the orthogonal photolithography process to create pixels of OLEDs.

Keywords

• diazonaphthoquinone (DNQ)
• fluoropolymer
• photolithography
• photoresist
• organic light-emitting diode (OLED)