Comparison of NH₃ and N₂O Plasma Treatments on Bi₂O₃ Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure

Abstract

In this study, bismuth trioxide (Bi2O3) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH3 and N2O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH3 or N2O plasma treated-Bi2O3 membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications.

Keywords

• bismuth trioxide
• plasma treatment
• NH₃ and N₂O
• nitrogen passivation
• grainization