We report a two-step growth process of MoS2 nanoflakes using a low-pressure chemical vapor deposition technique. In the first step, a MoS2 layer was synthesized on a c-plane sapphire substrate. This layer was subsequently re-evaporated at a higher temperature to form mono- or few-layer MoS2 flakes. As a result, the close proximity re-evaporation enabled the growth of pristine MoS2 nanoflakes. Atomic force microscopy analysis confirmed the synthesis of nanoclusters/nanoflakes with lateral dimensions of over 10 μm and a flake height of approximately 1.3 nm, demonstrating bi-layer MoS2, whereas transmission electron microscopy analysis revealed triangular MoS2 nanoflakes, with a diffraction pattern proving the presence of single crystalline hexagonal MoS2. Raman data revealed the typical modes of high-quality MoS2 nanoflakes. Finally, we presented the photocurrent dependence of a MoS2-based photoresist under illumination with light-emitting diode of 405 nm wavelength. The measured current–voltage dependence across various luminous flux outlined the sensitivity of MoS2 to polarized light and thus opens further opportunities for applications in high-performance photodetectors with polarization sensitivity.
