Concept model of atomic hydrogen dry developing process for photolithographic patterning
Yuki Takemori,
Masao Gohdo,
Yuta Koda,
Hideo Horibe
Affiliations
Yuki Takemori
Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sugimoto-ku, Osaka-shi, Osaka 558-8585, Japan
Masao Gohdo
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki-shi, Osaka 567-0047, Japan
Yuta Koda
Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sugimoto-ku, Osaka-shi, Osaka 558-8585, Japan
Hideo Horibe
Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sugimoto-ku, Osaka-shi, Osaka 558-8585, Japan
Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proof-of-concept study. Optical patterning was experimentally made on a thin layer of poly(methyl methacrylate) with benzophenone by UV light exposure with a photomask. The reaction system acted as a negative tone resist in the proposed process. Thus, a model system for a new atomic hydrogen dry development process was proposed and successfully demonstrated.
