Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment

Isabelle Servin; Alexandre Teolis; Arnaud Bazin; Paule Durin; Olha Sysova; Corinne Gablin; Benoît Saudet; Didier Leonard; Olivier Soppera; Jean-Louis Leclercq; Yann Chevolot; Raluca Tiron; Thierry Delair; Stéphane Trombotto

Micro and Nano Engineering (Jun 2023)

Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment

Isabelle Servin,
Alexandre Teolis,
Arnaud Bazin,
Paule Durin,
Olha Sysova,
Corinne Gablin,
Benoît Saudet,
Didier Leonard,
Olivier Soppera,
Jean-Louis Leclercq,
Yann Chevolot,
Raluca Tiron,
Thierry Delair,
Stéphane Trombotto

Affiliations

Isabelle Servin: Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France; Corresponding author.
Alexandre Teolis: Univ Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, France
Arnaud Bazin: Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France
Paule Durin: Univ Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, France; Univ. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France
Olha Sysova: Univ. de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; Univ. de Strasbourg, F-67000 Strasbourg, France
Corinne Gablin: Univ. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France
Benoît Saudet: Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France
Didier Leonard: Univ. Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, F-69100 Villeurbanne, France
Olivier Soppera: Univ. de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; Univ. de Strasbourg, F-67000 Strasbourg, France
Jean-Louis Leclercq: Univ Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, France
Yann Chevolot: Univ Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, F-69134 Ecully, France
Raluca Tiron: Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France
Thierry Delair: Univ Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, France
Stéphane Trombotto: Univ Lyon, Université Claude Bernard Lyon 1, CNRS, Ingénierie des Matériaux Polymères, IMP UMR 5223, F-69622 Villeurbanne Cedex, France

Journal volume & issue: Vol. 19
p. 100202

Abstract

Read online

Water-based bio-sourced resists are promising candidates as alternatives for deep ultraviolet (DUV) lithography by replacing current photoresists issued from petro-chemistry for microelectronics application. Chitosan films produced from seafood industry wastes enable patterning processes free of organic solvent and alkali-based developers, by substitution with water. After demonstrating high-resolution patterning at lab-scale after transfer into silica 10 mm wafer, we investigate here the industrial pre-transfer chitosan-based photoresist on the 300 mm pilot line scale at CEA-Leti for 193 nm DUV lithography.

Published in Micro and Nano Engineering

ISSN: 2590-0072 (Online)
Publisher: Elsevier
Country of publisher: Netherlands
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Electronics; Technology: Technology (General)
Website: https://www.journals.elsevier.com/micro-and-nano-engineering

About the journal

Abstract

Keywords