Proceedings (Dec 2020)

Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

  • Jaqueline Stauffenberg,
  • Ingo Ortlepp,
  • Christoph Reuter,
  • Mathias Holz,
  • Denis Dontsov,
  • Christoph Schäffel,
  • Steffen Strehle,
  • Jens-Peter Zöllner,
  • Ivo W. Rangelow,
  • Eberhard Manske

DOI
https://doi.org/10.3390/proceedings2020056034
Journal volume & issue
Vol. 56, no. 1
p. 34

Abstract

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The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used especially for field-emission scanning probe lithography (FESPL). The NFM-100 has a positioning range of Ø 100 mm, which offers, in combination with the tip-based measuring system, the possibility to analyse structures over long ranges. Using different gratings, the accuracy and the reproducibility of the NFM-100 and the AFM-system will be shown.

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