Significant Improvement of Copper Dry Etching Property of a High-Pressure Hydrogen-Based Plasma by Nitrogen Gas Addition

• Hiromasa Ohmi,
• Jumpei Sato,
• Yoshiki Shirasu,
• Tatsuya Hirano,
• Hiroaki Kakiuchi,
• Kiyoshi Yasutake

Affiliations

Hiromasa Ohmi

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan

Jumpei Sato

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan

Yoshiki Shirasu

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan

Tatsuya Hirano

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan

Hiroaki Kakiuchi

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan

Kiyoshi Yasutake

†Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Suita, Osaka, Japan