Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

Abstract

We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young's modulus and low shrinkage to provide good mechanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nanoimprint process. The nanoimprint experiments using four resins showed a superior performance of the GMN-PS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.

Keywords

• Nanoimprint stamps
• UV-curable polymers
• Nanoimprint lithography
• High-resolution patterning