Fabrication of a hot mirror using ITO-free electrochromic films

Abstract

In this study, WO3/Ag/W/WO3 (WAWW) films were deposited at room temperature on a B270 glass substrate from W and Ag targets using a radiofrequency magnetron reactive sputtering system. The influence of the thin tungsten interlayer on the electrical and optical properties of the WAWW layer structure was investigated through ellipsometry, a four-point probe and a spectrophotometer. It was determined that the thin tungsten interlayer effectively prevented the oxidation of the silver film. The WAWW film had a dielectric-metal-dielectric (DMD) layered structure with good electrical conductivity and high visible transmittance. The tungsten layer was no more than 2-nm thick. The sheet resistance and luminous transmittance of the WO3(29.5 nm)/Ag(14.2 nm)/W(2 nm)/WO3(68.6 nm) film were 4.64 Ω/sq and 65.4 %, respectively. Based on the WAWW four-layer structure, stacked WO3(29.5 nm)/Ag(14.2 nm)/W(2 nm)/WO3(68.6 nm)/Ag(16.9 nm)/W(2 nm)/WO3(30.4 nm) seven-layer structures deposited on B270 glass substrates were used for both ITO-free electrochromic and hot mirror applications. The visible (400–700 nm) and NIR (700–1200 nm) transmittance values of the bleached WAWW seven-layer structure were 71.5 % and 9.9 %, respectively. The visible transmittance of the colored WAWW seven-layer structure was 23.6 %. Finally, the bi-layer WAWW films were used to obtain an ITO-free WAWW seven-layer structure with a good electrochromic and optical performance.

Keywords

• WO3/Ag/W/WO3 (WAWW) films
• Dielectric-metal-dielectric
• Transmittance
• Hot mirror