Enhanced removal characteristics and research progress of hydrogen peroxide in electronic grade ultrapure water by group Ⅷ transition metals

Abstract

In the production process of electronic grade ultrapure water, trace H2O2 is mainly compounded by hydroxyl radicals generated by vacuum UV degradation devices, which can corrode certain specific processes of semiconductor materials surface cleaning. The application of multiphase nanocatalysation technology in advanced process semiconductor ultrapure water preparation system can effectively remove the micropollution H2O2 produced by vacuum ultraviolet irradiation, which is a green cleaning technology to promote the rapid dissociation of active oxygen species containing O—O bonds. The generation of micropollution H2O2 and its influence on the cleaning process of semiconductor materials were briefly discussed. The reaction pathway and mechanism of platinum series metal nanoparticles in group Ⅷ transition elements to catalyze H2O2 dissociation were analyzed. The effects of metal surface adsorption configuration, adsorption energy, electronic structure, carrier chemical properties, halogen anions in water and other factors on the enhanced removal characteristics of nanoparticles were also discussed. The application and research progress of group Ⅷ transition metals in ultrapure water production, detection and semiconductor assisted process systems were reviewed. The research provided reference for the construction of a new reaction system in ultrapure water process and the development and application of water treatment materials.

Keywords

• electronic grade ultrapure water
• micropollution control
• metal nanoparticles
• decomposition activity