Study on Temperature and Etching Effects on Silicon Oxide Formation Using Laser Ellipsometric Method

Abstract

In this paper, a laser ellipsometric method is implemented to study theformation of oxide films on silicon substrate at room temperature in air. Twolasers, He-Ne and semiconductor diode, as well as a tungsten halogen lamp,were used as a light source in this method to show the importance ofcoherency for accurate results. The thickness of oxide layer was measured andthe results is compared with that calculated for a monolayer of oxide.Behavior of thermally formed oxides was studied using ellipsometry todetermine polarizer angle as a function of etching time.

Keywords

• native oxides
• ellipsometry
• silicon devices
• laser polarization