Coherent X-ray measurement of step-flow propagation during growth on polycrystalline thin film surfaces

Randall L. Headrick; Jeffrey G. Ulbrandt; Peco Myint; Jing Wan; Yang Li; Andrei Fluerasu; Yugang Zhang; Lutz Wiegart; Karl F. Ludwig

doi:10.1038/s41467-019-10629-8

Nature Communications (Jun 2019)

Coherent X-ray measurement of step-flow propagation during growth on polycrystalline thin film surfaces

Randall L. Headrick,
Jeffrey G. Ulbrandt,
Peco Myint,
Jing Wan,
Yang Li,
Andrei Fluerasu,
Yugang Zhang,
Lutz Wiegart,
Karl F. Ludwig

Affiliations

Randall L. Headrick: Department of Physics and Materials Science Program, University of Vermont
Jeffrey G. Ulbrandt: Department of Physics and Materials Science Program, University of Vermont
Peco Myint: Division of Materials Science and Engineering, Boston University
Jing Wan: Department of Physics and Materials Science Program, University of Vermont
Yang Li: Department of Physics and Materials Science Program, University of Vermont
Andrei Fluerasu: National Synchrotron Light Source II
Yugang Zhang: National Synchrotron Light Source II
Lutz Wiegart: National Synchrotron Light Source II
Karl F. Ludwig: Division of Materials Science and Engineering, Boston University

DOI: https://doi.org/10.1038/s41467-019-10629-8
Journal volume & issue: Vol. 10, no. 1
pp. 1 – 9

Abstract

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Monitoring growth dynamics of crystalline thin materials progressively is crucial to understand the mechanism. Here, the authors develop a local step flow model to investigate the growth of C60 films on graphene coated over silicon substrates that correlates the step-edge velocity with its terrace lengths using the X-ray photon correlation spectroscopy.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

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