Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography

• Xue Cong,
• Siliang Zhang,
• Jiaxing Gao,
• Xuewen Cui,
• Yurui Wu,
• Xudong Guo,
• Rui Hu,
• Shuangqing Wang,
• Jinping Chen,
• Yi Li,
• Guoqiang Yang

Affiliations

Xue Cong

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Siliang Zhang

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Jiaxing Gao

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Xuewen Cui

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Yurui Wu

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Xudong Guo

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Rui Hu

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Shuangqing Wang

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Jinping Chen

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Yi Li

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China

Guoqiang Yang

Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Beijing, China